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    HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

    New search for: ISHIDA SHINTARO

    실시형태에 관련된 세라믹스 원통형 타깃재는, 내주면의 표면 조도 Ra 가 1.2 ㎛ 이하이다.

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    HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

    New search for: ISHIDA SHINTARO

    실시형태에 관련된 세라믹스 원통형 타깃재는, 내주면의 표면 조도 Ra 가 1.2 ㎛ 이하이다.

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    HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

    New search for: ISHIDA SHINTARO

    실시형태에 관련된 세라믹스 원통형 타깃재는, 내주면의 표면 조도 Ra 가 1.2 ㎛ 이하이다.

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    Document information
    Title:

    HOLLOW CYLINDRICAL CERAMIC TARGET MATERIAL AND HOLLOW CYLINDRICAL SPUTTERING TARGET

    Additional title:

    세라믹스 원통형 타깃재 및 원통형 스퍼터링 타깃

    Contributors:

    ISHIDA SHINTARO (author)

    Publication date:

    2017-11-06

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    Korean

    Classification:

    IPC:  C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / C04B Kalk , LIME

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