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Realization of Si~1~-~x~-~yGe~xC~y/Si heterostructures by pulsed-laser-induced epitaxy of C^+ implanted pseudomorphic SiGe films and of a-SiGeC:H films deposited on Si(100) [2403-35]
Realization of Si~1~-~x~-~yGe~xC~y/Si heterostructures by pulsed-laser-induced epitaxy of C^+ implanted pseudomorphic SiGe films and of a-SiGeC:H films deposited on Si(100) [2403-35]
Realization of Si~1~-~x~-~yGe~xC~y/Si heterostructures by pulsed-laser-induced epitaxy of C^+ implanted pseudomorphic SiGe films and of a-SiGeC:H films deposited on Si(100) [2403-35]
Boulmer, J. (author) / Desmur-Larre, A. (author) / Guedj, C. (author) / Debarre, D. (author) / Dobowski, J. J. / SPIE
Conference, Laser-induced thin film processing ; 1995 ; San Jose; CA
1995-01-01
12 pages
Conference paper
English
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