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    Chemical Vapor Deposition of Cr-Based Thin Films as Diffusion Barriers in Copper Metallization

    New search for: Maury, F.
    New search for: Gasqueres, C.
    New search for: Duminica, F.-D.
    New search for: Ossola, F.

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    Chemical Vapor Deposition of Cr-Based Thin Films as Diffusion Barriers in Copper Metallization

    New search for: Maury, F.
    New search for: Gasqueres, C.
    New search for: Duminica, F.-D.
    New search for: Ossola, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Chemical Vapor Deposition of Cr-Based Thin Films as Diffusion Barriers in Copper Metallization

    New search for: Maury, F.
    New search for: Gasqueres, C.
    New search for: Duminica, F.-D.
    New search for: Ossola, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    Chemical Vapor Deposition of Cr-Based Thin Films as Diffusion Barriers in Copper Metallization

    Contributors:

    Maury, F. (author) / Gasqueres, C. (author) / Duminica, F.-D. (author) / Ossola, F. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 426/432 ; 3439-3444

    Publication date:

    2003-01-01

    Size:

    6 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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