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    Thermal chemical vapour deposition of copper films from copper ethylacetoacetate: microstructure and electrical resistivity

    New search for: Devi, A.
    New search for: Shivashankar, S. A.

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    Thermal chemical vapour deposition of copper films from copper ethylacetoacetate: microstructure and electrical resistivity

    New search for: Devi, A.
    New search for: Shivashankar, S. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermal chemical vapour deposition of copper films from copper ethylacetoacetate: microstructure and electrical resistivity

    New search for: Devi, A.
    New search for: Shivashankar, S. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Thermal chemical vapour deposition of copper films from copper ethylacetoacetate: microstructure and electrical resistivity

    Contributors:

    Devi, A. (author) / Shivashankar, S. A. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 17 ; 367-370

    Publication date:

    1998-01-01

    Size:

    4 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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