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    Silicon dioxide film deposited by photoassisted microwave plasma CVD using TEOS

    New search for: Suzuki, N.
    New search for: Masu, K.
    New search for: Tsubouchi, K.

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    Silicon dioxide film deposited by photoassisted microwave plasma CVD using TEOS

    New search for: Suzuki, N.
    New search for: Masu, K.
    New search for: Tsubouchi, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Silicon dioxide film deposited by photoassisted microwave plasma CVD using TEOS

    New search for: Suzuki, N.
    New search for: Masu, K.
    New search for: Tsubouchi, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Silicon dioxide film deposited by photoassisted microwave plasma CVD using TEOS

    Contributors:

    Suzuki, N. (author) / Masu, K. (author) / Tsubouchi, K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 79/80 ; 327

    Publication date:

    1994-01-01

    Size:

    327 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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