Aluminum chemical vapor deposition reaction of dimethylaluminum hydride on TiN studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

Tanaka, K. / Yanashima, H. / Yako, T. et al. | British Library Online Contents | 2001

Photoinitiation effect during photo-induced deposition of aluminum films using dimethylaluminum hydride

Kawai, T. / Okawa, M. / Komatsu, A. et al. | British Library Online Contents | 1994

Thermal decomposition of dimethylaluminum isopropoxide on Si(1 0 0)

Lee, S. Y. / Luo, B. / Sun, Y. et al. | British Library Online Contents | 2004

The initial stage of nucleation and growth of Al on H/Si(100)-1 x 1 by dimethylaluminum hydride vapor deposition

Shen, T.-C. / Wang, C. / Tucker, J. R. | British Library Online Contents | 1999

Photoelectron Spectroscopy Study of Ammonia Adsorption on ZnO(10&unknown;10)

Ozawa, K. / Edamoto, K. | British Library Online Contents | 2002