Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Aluminum chemical vapor deposition reaction of dimethylaluminum hydride on TiN studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

    New search for: Tanaka, K.
    New search for: Yanashima, H.
    New search for: Yako, T.
    New search for: Kamio, K.
    New search for: Sugai, K.
    New search for: Kishida, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Aluminum chemical vapor deposition reaction of dimethylaluminum hydride on TiN studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

    New search for: Tanaka, K.
    New search for: Yanashima, H.
    New search for: Yako, T.
    New search for: Kamio, K.
    New search for: Sugai, K.
    New search for: Kishida, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Aluminum chemical vapor deposition reaction of dimethylaluminum hydride on TiN studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

    New search for: Tanaka, K.
    New search for: Yanashima, H.
    New search for: Yako, T.
    New search for: Kamio, K.
    New search for: Sugai, K.
    New search for: Kishida, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Aluminum chemical vapor deposition reaction of dimethylaluminum hydride on TiN studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

    Contributors:

    Tanaka, K. (author) / Yanashima, H. (author) / Yako, T. (author) / Kamio, K. (author) / Sugai, K. (author) / Kishida, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 171 ; 71-81

    Publication date:

    2001-01-01

    Size:

    11 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    X-ray photoelectron spectroscopy study of adsorption and photodissociation of dimethylaluminum hydride

    Okawa, M. / Tsuruta, H. / Hanabusa, M. | British Library Online Contents | 1994

    Photoinitiation effect during photo-induced deposition of aluminum films using dimethylaluminum hydride

    Kawai, T. / Okawa, M. / Komatsu, A. et al. | British Library Online Contents | 1994

    The initial stage of nucleation and growth of Al on H/Si(100)-1 x 1 by dimethylaluminum hydride vapor deposition

    Shen, T.-C. / Wang, C. / Tucker, J. R. | British Library Online Contents | 1999

    Hydriding Chemical Vapor Deposition of Metal Hydride Nano-Fibers

    Saita, I. / Toshima, T. / Tanda, S. et al. | British Library Online Contents | 2006

    Photoelectron spectroscopy study of amorphous silicon-carbon alloys deposited by plasma-enhanced chemical vapor deposition

    Cicala, G. / Bruno, G. / Capezzuto, P. et al. | British Library Online Contents | 1996

    Back to top