The initial stage of nucleation and growth of Al on H/Si(100)-1 x 1 by dimethylaluminum hydride vapor deposition: Fid-Bau Portal

The initial stage of nucleation and growth of Al on H/Si(100)-1 x 1 by dimethylaluminum hydride vapor deposition

Shen, T.-C. / Wang, C. / Tucker, J. R.

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The initial stage of nucleation and growth of Al on H/Si(100)-1 x 1 by dimethylaluminum hydride vapor deposition

Shen, T.-C. / Wang, C. / Tucker, J. R.

The initial stage of nucleation and growth of Al on H/Si(100)-1 x 1 by dimethylaluminum hydride vapor deposition

Shen, T.-C. / Wang, C. / Tucker, J. R.

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Check availability in my library

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Document information

Title:

The initial stage of nucleation and growth of Al on H/Si(100)-1 x 1 by dimethylaluminum hydride vapor deposition

Contributors:

Shen, T.-C. (author) / Wang, C. (author) / Tucker, J. R. (author)

Published in:

APPLIED SURFACE SCIENCE ; 141 ; 228-236

Publication date:

1999-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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