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    Copper Metallization Technology for Deep Submicron ULSIs

    New search for: Arita, Y.
    New search for: Awaya, N.
    New search for: Ohno, K.
    New search for: Sato, M.

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    Copper Metallization Technology for Deep Submicron ULSIs

    New search for: Arita, Y.
    New search for: Awaya, N.
    New search for: Ohno, K.
    New search for: Sato, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Copper Metallization Technology for Deep Submicron ULSIs

    New search for: Arita, Y.
    New search for: Awaya, N.
    New search for: Ohno, K.
    New search for: Sato, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Copper Metallization Technology for Deep Submicron ULSIs

    Contributors:

    Arita, Y. (author) / Awaya, N. (author) / Ohno, K. (author) / Sato, M. (author)

    Published in:

    MRS BULLETIN- MATERIALS RESEARCH SOCIETY ; 19 ; 68

    Publication date:

    1994-01-01

    Size:

    68 pages

    ISSN:

    0883-7694

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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