Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm: Fid-Bau Portal

Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm

Jiang, W. / Baumgaertner, H. / Eisele, I.

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Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm

Jiang, W. / Baumgaertner, H. / Eisele, I.

Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm

Jiang, W. / Baumgaertner, H. / Eisele, I.

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Check availability in my library

Order at Subito €

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Document information

Title:

Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm

Contributors:

Jiang, W. (author) / Baumgaertner, H. (author) / Eisele, I. (author) / Dieleman, J. / Biermann, U. K. P. / Hess, P.

Published in:

Photon-Assisted Processing of Surfaces and Thin Films ; 564

APPLIED SURFACE SCIENCE ; 86

Publication date:

1995-01-01

Size:

564 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

Baumgaertner, H. / Jiang, W. / Eisele, I. | British Library Online Contents | 1996

Excimer laser-assisted etching of silicon in chlorine: adsorption and desorption

Kuzmichov, A. V. | British Library Online Contents | 1995

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Zimmer, K. / Dienelt, J. / Herfurth, F. et al. | British Library Online Contents | 1998

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Boatner, L. / Longmire, H. / Rouleau, C. et al. | British Library Online Contents | 2008

Excimer-laser induced chemical etching of transition metals

O`Driscoll, C. / Winfield, R. / Khalfi, K. et al. | British Library Online Contents | 2000