Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Rapid thermal oxidation of epitaxial SiGe thin films

    New search for: Terrasi, A.
    New search for: Scalese, S.
    New search for: Adorno, R.
    New search for: Ferlito, E.
    New search for: Spadafora, M.
    New search for: Rimini, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Rapid thermal oxidation of epitaxial SiGe thin films

    New search for: Terrasi, A.
    New search for: Scalese, S.
    New search for: Adorno, R.
    New search for: Ferlito, E.
    New search for: Spadafora, M.
    New search for: Rimini, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Rapid thermal oxidation of epitaxial SiGe thin films

    New search for: Terrasi, A.
    New search for: Scalese, S.
    New search for: Adorno, R.
    New search for: Ferlito, E.
    New search for: Spadafora, M.
    New search for: Rimini, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Rapid thermal oxidation of epitaxial SiGe thin films

    Contributors:

    Terrasi, A. (author) / Scalese, S. (author) / Adorno, R. (author) / Ferlito, E. (author) / Spadafora, M. (author) / Rimini, E. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 269 - 273

    Publication date:

    2002-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Strain relaxation through islands formation in epitaxial SiGe thin films

    Barucca, G. / Lucchetti, L. / Majni, G. et al. | British Library Online Contents | 1996

    Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics

    He, B. C. / Wen, H. C. / Chinag, T. Y. et al. | British Library Online Contents | 2010

    Epitaxial growth of SiGe thin films by ion-beam sputtering

    Sasaki, K. / Nakata, K. / Hata, T. | British Library Online Contents | 1997

    MATERIALS - Cold-wall UHV-CVD for Si-SiGe(C) epitaxial thin films - Using a UHV-CVD system, engineers have developed a low thermal budget selective epitaxial process that delivers precise SiGe composition.

    Mashiro, Supika | Online Contents | 2003

    Role of thermal annealing on SiGe thin films fabricated by PECVD

    Joseph, Sudha / Saraf, Nileshi / Umamaheswara, Adithi et al. | British Library Online Contents | 2015

    Back to top