Study of near-surface microdefects in Czochralski-Si wafers after a CMOS thermal process: Fid-Bau Portal

Study of near-surface microdefects in Czochralski-Si wafers after a CMOS thermal process

Kitagawara, Y. / Aihara, K. / Oka, S. / Takenaka, T.

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Study of near-surface microdefects in Czochralski-Si wafers after a CMOS thermal process

Kitagawara, Y. / Aihara, K. / Oka, S. / Takenaka, T.

Study of near-surface microdefects in Czochralski-Si wafers after a CMOS thermal process

Kitagawara, Y. / Aihara, K. / Oka, S. / Takenaka, T.

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Document information

Title:

Study of near-surface microdefects in Czochralski-Si wafers after a CMOS thermal process

Contributors:

Kitagawara, Y. (author) / Aihara, K. (author) / Oka, S. (author) / Takenaka, T. (author)

Published in:

MATERIALS SCIENCE FORUM ; 1835-1840

Publication date:

1995-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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