Effects of annealing in oxygen and nitrogen atmosphere on F.Z. silicon wafers: Fid-Bau Portal

Effects of annealing in oxygen and nitrogen atmosphere on F.Z. silicon wafers

Gay, N. / Floret, F. / Martinuzzi, S. / Roux, L. / Arnould, J. / Mathieu, G.

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Effects of annealing in oxygen and nitrogen atmosphere on F.Z. silicon wafers

Gay, N. / Floret, F. / Martinuzzi, S. / Roux, L. / Arnould, J. / Mathieu, G.

Effects of annealing in oxygen and nitrogen atmosphere on F.Z. silicon wafers

Gay, N. / Floret, F. / Martinuzzi, S. / Roux, L. / Arnould, J. / Mathieu, G.

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Check availability in my library

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Document information

Title:

Effects of annealing in oxygen and nitrogen atmosphere on F.Z. silicon wafers

Contributors:

Gay, N. (author) / Floret, F. (author) / Martinuzzi, S. (author) / Roux, L. (author) / Arnould, J. (author) / Mathieu, G. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 36 ; 125-128

Publication date:

1996-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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