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Thermal anneal activation of defects in hydrogen plasma-treated silicon

Nam, C. W. / Tanabe, A. / Ashok, S.

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Thermal anneal activation of defects in hydrogen plasma-treated silicon

Nam, C. W. / Tanabe, A. / Ashok, S.

Thermal anneal activation of defects in hydrogen plasma-treated silicon

Nam, C. W. / Tanabe, A. / Ashok, S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Thermal anneal activation of defects in hydrogen plasma-treated silicon

Contributors:

Nam, C. W. (author) / Tanabe, A. (author) / Ashok, S. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 36 ; 255-258

Publication date:

1996-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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