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Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

Hwang, H.-L. / Chen, P.-C. / Hsu, K. Y. J.

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Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

Hwang, H.-L. / Chen, P.-C. / Hsu, K. Y. J.

Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

Hwang, H.-L. / Chen, P.-C. / Hsu, K. Y. J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

Contributors:

Hwang, H.-L. (author) / Chen, P.-C. (author) / Hsu, K. Y. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 92 ; 180-192

Publication date:

1996-01-01

Size:

13 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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