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NH3-RTP grown ultra-thin oxynitride layers for MOS gate applications
NH3-RTP grown ultra-thin oxynitride layers for MOS gate applications
NH3-RTP grown ultra-thin oxynitride layers for MOS gate applications
Chung, H. Y. (author) / Dietl, W. (author) / Niess, J. (author) / Nenyei, Z. (author) / Lerch, W. (author) / Wieczorek, K. (author) / Krumm, N. (author) / Ludsteck, A. (author) / Eisele, I. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 118 ; 55-59
2005-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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