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    Plasma assisted oxidation of SiGe layers at 500C: interface characterization

    New search for: Tetelin, C.
    New search for: Wallart, X.
    New search for: Vescan, L.
    New search for: Nys, J. P.

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    Plasma assisted oxidation of SiGe layers at 500C: interface characterization

    New search for: Tetelin, C.
    New search for: Wallart, X.
    New search for: Vescan, L.
    New search for: Nys, J. P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Plasma assisted oxidation of SiGe layers at 500C: interface characterization

    New search for: Tetelin, C.
    New search for: Wallart, X.
    New search for: Vescan, L.
    New search for: Nys, J. P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Plasma assisted oxidation of SiGe layers at 500C: interface characterization

    Contributors:

    Tetelin, C. (author) / Wallart, X. (author) / Vescan, L. (author) / Nys, J. P. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 104/105 ; 385-391

    Publication date:

    1996-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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