Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering: Fid-Bau Portal

Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

Huang, C.-T. / Duh, J.-G.

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Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

Huang, C.-T. / Duh, J.-G.

Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

Huang, C.-T. / Duh, J.-G.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

Contributors:

Huang, C.-T. (author) / Duh, J.-G. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 16 ; 59-61

Publication date:

1997-01-01

Size:

3 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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