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    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

    New search for: Zhang, Z.
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    New search for: Sullivan, M. B.
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    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

    New search for: Zhang, Z.
    New search for: Jin, H.
    New search for: Chai, J.
    New search for: Pan, J.
    New search for: Seng, H. L.
    New search for: Goh, G. T.
    New search for: Wong, L. M.
    New search for: Sullivan, M. B.
    New search for: Wang, S. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

    New search for: Zhang, Z.
    New search for: Jin, H.
    New search for: Chai, J.
    New search for: Pan, J.
    New search for: Seng, H. L.
    New search for: Goh, G. T.
    New search for: Wong, L. M.
    New search for: Sullivan, M. B.
    New search for: Wang, S. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

    Contributors:

    Zhang, Z. (author) / Jin, H. (author) / Chai, J. (author) / Pan, J. (author) / Seng, H. L. (author) / Goh, G. T. (author) / Wong, L. M. (author) / Sullivan, M. B. (author) / Wang, S. J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 368 ; 88-96

    Publication date:

    2016-01-01

    Size:

    9 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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