Modeling of Polishing Pad Wear in Chemical Mechanical Polishing: Fid-Bau Portal

Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Li, M. / Zhu, Y.W. / Li, J. / Lin, K.

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Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Li, M. / Zhu, Y.W. / Li, J. / Lin, K.

Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Li, M. / Zhu, Y.W. / Li, J. / Lin, K.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Contributors:

Li, M. (author) / Zhu, Y.W. (author) / Li, J. (author) / Lin, K. (author) / Yao, Y. / Zuo, D. / Xu, X.

Published in:

Machining and Advanced Manufacturing Technology X ; 318-321

KEY ENGINEERING MATERIALS ; 431/432

Publication date:

2010-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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