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Ultra thin gate oxide reliability enhanced by carbon contamination free process
Ultra thin gate oxide reliability enhanced by carbon contamination free process
Ultra thin gate oxide reliability enhanced by carbon contamination free process
Iwamoto, T. (author) / Ohmi, T. (author)
APPLIED SURFACE SCIENCE ; 117/118 ; 237-240
1997-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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