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On ultra-thin oxide/Si and very-thin oxide/Si structures prepared by wet chemical process

Pincik, E. / Kobayashi, H. / Rusnak, J. / Kim, W. B. / Brunner, R. / Malinovsky, L. / Matsumoto, T. / Imamura, K. / Jergel, M. / Takahashi, M.

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On ultra-thin oxide/Si and very-thin oxide/Si structures prepared by wet chemical process

Pincik, E. / Kobayashi, H. / Rusnak, J. / Kim, W. B. / Brunner, R. / Malinovsky, L. / Matsumoto, T. / Imamura, K. / Jergel, M. / Takahashi, M.

On ultra-thin oxide/Si and very-thin oxide/Si structures prepared by wet chemical process

Pincik, E. / Kobayashi, H. / Rusnak, J. / Kim, W. B. / Brunner, R. / Malinovsky, L. / Matsumoto, T. / Imamura, K. / Jergel, M. / Takahashi, M.

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Document information

Title:

On ultra-thin oxide/Si and very-thin oxide/Si structures prepared by wet chemical process

Contributors:

Pincik, E. (author) / Kobayashi, H. (author) / Rusnak, J. (author) / Kim, W. B. (author) / Brunner, R. (author) / Malinovsky, L. (author) / Matsumoto, T. (author) / Imamura, K. (author) / Jergel, M. (author) / Takahashi, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 256 ; 5757-5764

Publication date:

2010-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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