Implantation of reactive and unreactive ions in silicon: Fid-Bau Portal

Implantation of reactive and unreactive ions in silicon

Brucato, J. R. / Baratta, G. A. / Compagnini, G. / Strazzulla, G.

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Implantation of reactive and unreactive ions in silicon

Brucato, J. R. / Baratta, G. A. / Compagnini, G. / Strazzulla, G.

Implantation of reactive and unreactive ions in silicon

Brucato, J. R. / Baratta, G. A. / Compagnini, G. / Strazzulla, G.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Implantation of reactive and unreactive ions in silicon

Contributors:

Brucato, J. R. (author) / Baratta, G. A. (author) / Compagnini, G. (author) / Strazzulla, G. (author)

Published in:

MATERIALS SCIENCE FORUM ; 258/263 ; 611-616

Publication date:

1997-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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