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    Reactive sputter deposition and characterization of tantalum nitride thin films

    New search for: Radhakrishnan, K.
    New search for: Geok Ing, N.
    New search for: Gopalakrishnan, R.

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    Reactive sputter deposition and characterization of tantalum nitride thin films

    New search for: Radhakrishnan, K.
    New search for: Geok Ing, N.
    New search for: Gopalakrishnan, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Reactive sputter deposition and characterization of tantalum nitride thin films

    New search for: Radhakrishnan, K.
    New search for: Geok Ing, N.
    New search for: Gopalakrishnan, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Reactive sputter deposition and characterization of tantalum nitride thin films

    Contributors:

    Radhakrishnan, K. (author) / Geok Ing, N. (author) / Gopalakrishnan, R. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 57 ; 224-227

    Publication date:

    1999-01-01

    Size:

    4 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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