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    Sputter Deposition of Tantalum-Nitride Films on Copper Using an RF-Plasma

    New search for: Walter, K. C.
    New search for: Fetherston, R. P.
    New search for: Sridharan, K.
    New search for: Chen, A.

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    Sputter Deposition of Tantalum-Nitride Films on Copper Using an RF-Plasma

    New search for: Walter, K. C.
    New search for: Fetherston, R. P.
    New search for: Sridharan, K.
    New search for: Chen, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Sputter Deposition of Tantalum-Nitride Films on Copper Using an RF-Plasma

    New search for: Walter, K. C.
    New search for: Fetherston, R. P.
    New search for: Sridharan, K.
    New search for: Chen, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Sputter Deposition of Tantalum-Nitride Films on Copper Using an RF-Plasma

    Contributors:

    Walter, K. C. (author) / Fetherston, R. P. (author) / Sridharan, K. (author) / Chen, A. (author)

    Published in:

    MATERIALS RESEARCH BULLETIN ; 29 ; 827

    Publication date:

    1994-01-01

    Size:

    827 pages

    ISSN:

    0025-5408

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11 / 620

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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