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    Selectivity in low pressure chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-trimethylvinyl-silane in the presence of water

    New search for: Stumm, T. H.
    New search for: Van den Bergh, H.

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    Selectivity in low pressure chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-trimethylvinyl-silane in the presence of water

    New search for: Stumm, T. H.
    New search for: Van den Bergh, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Selectivity in low pressure chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-trimethylvinyl-silane in the presence of water

    New search for: Stumm, T. H.
    New search for: Van den Bergh, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Selectivity in low pressure chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-trimethylvinyl-silane in the presence of water

    Contributors:

    Stumm, T. H. (author) / Van den Bergh, H. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 23 ; 48

    Publication date:

    1994-01-01

    Size:

    48 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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