Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethyl-silane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper

Park, M.-Y. / Son, J.-H. / Kang, S.-W. et al. | British Library Online Contents | 1999

Selectivity in low pressure chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-trimethylvinyl-silane in the presence of water

Stumm, T. H. / Van den Bergh, H. | British Library Online Contents | 1994

XPS studies of copper deposition from 1,5-cyclooctadiene-copper(I)-hexafluoroacetylacetonate on Si(111)

Cheng, T. Q. / Griffiths, K. / Norton, P. R. et al. | British Library Online Contents | 1998

Chemical Vapor Deposition of Copper for Multilevel Metallization

Kaloyeros, A. E. / Fury, M. A. | British Library Online Contents | 1993

Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Takenaka, K. / Shiratani, M. / Onishi, M. et al. | British Library Online Contents | 2002