Cl"2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn: Fid-Bau Portal

Cl"2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn

Jung, K.B. / Cho, H. / Hahn, Y.B. / Hays, D.C. / Feng, T. / Park, Y.D. / Childress, J.R. / Pearton, S.J.

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Cl"2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn

Jung, K.B. / Cho, H. / Hahn, Y.B. / Hays, D.C. / Feng, T. / Park, Y.D. / Childress, J.R. / Pearton, S.J.

Cl"2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn

Jung, K.B. / Cho, H. / Hahn, Y.B. / Hays, D.C. / Feng, T. / Park, Y.D. / Childress, J.R. / Pearton, S.J.

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Title:

Cl"2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn

Contributors:

Jung, K.B. (author) / Cho, H. (author) / Hahn, Y.B. (author) / Hays, D.C. (author) / Feng, T. (author) / Park, Y.D. (author) / Childress, J.R. (author) / Pearton, S.J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 60 ; 101 - 106

Publication date:

1999-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Cho, H. / Jung, K.B. / Hays, D.C. et al. | British Library Online Contents | 1999

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