Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures: Fid-Bau Portal

Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures

Cho, H. / Jung, K.B. / Hays, D.C. / Hahn, Y.B. / Feng, T. / Park, Y.D. / Childress, J.R. / Cadieu, F.J. / Rani, R. / Qian, X.R.

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Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures

Cho, H. / Jung, K.B. / Hays, D.C. / Hahn, Y.B. / Feng, T. / Park, Y.D. / Childress, J.R. / Cadieu, F.J. / Rani, R. / Qian, X.R.

Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures

Cho, H. / Jung, K.B. / Hays, D.C. / Hahn, Y.B. / Feng, T. / Park, Y.D. / Childress, J.R. / Cadieu, F.J. / Rani, R. / Qian, X.R.

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Document information

Title:

Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures

Contributors:

Cho, H. (author) / Jung, K.B. (author) / Hays, D.C. (author) / Hahn, Y.B. (author) / Feng, T. (author) / Park, Y.D. (author) / Childress, J.R. (author) / Cadieu, F.J. (author) / Rani, R. (author) / Qian, X.R. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 60 ; 107 - 111

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Jung, K.B. / Cho, H. / Hahn, Y.B. et al. | British Library Online Contents | 1999

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Interhalogen plasma chemistries for dry etch patterning of Ni, Fe, NiFe and NiFeCo thin films

Cho, H. / Jung, K. B. / Hays, D. C. et al. | British Library Online Contents | 1999

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