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Selective dry etching using inductively coupled plasmas - Part I. GaAs/AlGaAs and GaAs/InGaP
Selective dry etching using inductively coupled plasmas - Part I. GaAs/AlGaAs and GaAs/InGaP
Selective dry etching using inductively coupled plasmas - Part I. GaAs/AlGaAs and GaAs/InGaP
Hays, D.C. (author) / Cho, H. (author) / Jung, K.B. (author) / Hahn, Y.B. (author) / Abernathy, C.R. (author) / Pearton, S.J. (author) / Ren, F. (author) / Hobson, W.S. (author)
APPLIED SURFACE SCIENCE ; 147 ; 125-133
1999-01-01
9 pages
Article (Journal)
English
DDC:
621.35
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