Search

Selective dry etching using inductively coupled plasmas - Part II. InN/GaN and InN/AlN

Hays, D.C. / Cho, H. / Jung, K.B. / Hahn, Y.B. / Abernathy, C.R. / Pearton, S.J. / Ren, F. / Hun, J. / Shul, R.J.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Selective dry etching using inductively coupled plasmas - Part II. InN/GaN and InN/AlN

Hays, D.C. / Cho, H. / Jung, K.B. / Hahn, Y.B. / Abernathy, C.R. / Pearton, S.J. / Ren, F. / Hun, J. / Shul, R.J.

Selective dry etching using inductively coupled plasmas - Part II. InN/GaN and InN/AlN

Hays, D.C. / Cho, H. / Jung, K.B. / Hahn, Y.B. / Abernathy, C.R. / Pearton, S.J. / Ren, F. / Hun, J. / Shul, R.J.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Selective dry etching using inductively coupled plasmas - Part II. InN/GaN and InN/AlN

Contributors:

Hays, D.C. (author) / Cho, H. (author) / Jung, K.B. (author) / Hahn, Y.B. (author) / Abernathy, C.R. (author) / Pearton, S.J. (author) / Ren, F. (author) / Hun, J. (author) / Shul, R.J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 147 ; 134-139

Publication date:

1999-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Hays, D.C. / Cho, H. / Jung, K.B. et al. | British Library Online Contents | 1999

Kinetics of etching in inductively coupled plasmas

Kim, M. T. | British Library Online Contents | 2004

Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas

PARK, S. G. / KIM, C. W. / SONG, H. Y. et al. | British Library Online Contents | 2005

Dry etching characteristics of GaN using Cl2/BCl3 inductively coupled plasmas

Zhou, S. / Cao, B. / Liu, S. | British Library Online Contents | 2010

Development of optical computerized tomography in capacitively coupled plasmas and inductively coupled plasmas for plasma etching

Makabe, T. / Petrovic, Z. L. | British Library Online Contents | 2002