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Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas

PARK, S. G. / KIM, C. W. / SONG, H. Y. / KIM, H. W. / MYUNG, J. H. / JOO, S. / PARK, S. O. / LEE, K. M.

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Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas

PARK, S. G. / KIM, C. W. / SONG, H. Y. / KIM, H. W. / MYUNG, J. H. / JOO, S. / PARK, S. O. / LEE, K. M.

Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas

PARK, S. G. / KIM, C. W. / SONG, H. Y. / KIM, H. W. / MYUNG, J. H. / JOO, S. / PARK, S. O. / LEE, K. M.

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Document information

Title:

Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas

Contributors:

PARK, S. G. (author) / KIM, C. W. (author) / SONG, H. Y. (author) / KIM, H. W. (author) / MYUNG, J. H. (author) / JOO, S. (author) / PARK, S. O. (author) / LEE, K. M. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 40 ; 5015-5016

Publication date:

2005-01-01

Size:

2 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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