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    Photoelastic characterization of residual strain in GaAs wafers annealed in holders of different geometry

    New search for: Herms, M.
    New search for: Fukuzawa, M.
    New search for: Yamada, M.
    New search for: Klober, J.
    New search for: Zychowitz, G.
    New search for: Niklas, J.R.

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    Photoelastic characterization of residual strain in GaAs wafers annealed in holders of different geometry

    New search for: Herms, M.
    New search for: Fukuzawa, M.
    New search for: Yamada, M.
    New search for: Klober, J.
    New search for: Zychowitz, G.
    New search for: Niklas, J.R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Photoelastic characterization of residual strain in GaAs wafers annealed in holders of different geometry

    New search for: Herms, M.
    New search for: Fukuzawa, M.
    New search for: Yamada, M.
    New search for: Klober, J.
    New search for: Zychowitz, G.
    New search for: Niklas, J.R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Photoelastic characterization of residual strain in GaAs wafers annealed in holders of different geometry

    Contributors:

    Herms, M. (author) / Fukuzawa, M. (author) / Yamada, M. (author) / Klober, J. (author) / Zychowitz, G. (author) / Niklas, J.R. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 66 ; 7 - 10

    Publication date:

    1999-01-01

    Size:

    4 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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