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    Photoelastic characterization of residual stress in GaAs-wafers

    New search for: Geiler, H. D.
    New search for: Karge, H.
    New search for: Wagner, M.
    New search for: Eichler, S.
    New search for: Jurisch, M.
    New search for: Kretzer, U.
    New search for: Scheffer-Czygan, M.

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    Photoelastic characterization of residual stress in GaAs-wafers

    New search for: Geiler, H. D.
    New search for: Karge, H.
    New search for: Wagner, M.
    New search for: Eichler, S.
    New search for: Jurisch, M.
    New search for: Kretzer, U.
    New search for: Scheffer-Czygan, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Photoelastic characterization of residual stress in GaAs-wafers

    New search for: Geiler, H. D.
    New search for: Karge, H.
    New search for: Wagner, M.
    New search for: Eichler, S.
    New search for: Jurisch, M.
    New search for: Kretzer, U.
    New search for: Scheffer-Czygan, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Photoelastic characterization of residual stress in GaAs-wafers

    Contributors:

    Geiler, H. D. (author) / Karge, H. (author) / Wagner, M. (author) / Eichler, S. (author) / Jurisch, M. (author) / Kretzer, U. (author) / Scheffer-Czygan, M. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 345-350

    Publication date:

    2006-01-01

    Size:

    6 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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