TEM characterisation of high pressure-high-temperature-treated Czochralski silicon samples: Fid-Bau Portal

TEM characterisation of high pressure-high-temperature-treated Czochralski silicon samples

Romano-Rodriguez, A. / Bachrouri, A. / Lopez, M. / Morante, J. R. / Misiuk, A. / Surma, B. / Jun, J.

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TEM characterisation of high pressure-high-temperature-treated Czochralski silicon samples

Romano-Rodriguez, A. / Bachrouri, A. / Lopez, M. / Morante, J. R. / Misiuk, A. / Surma, B. / Jun, J.

TEM characterisation of high pressure-high-temperature-treated Czochralski silicon samples

Romano-Rodriguez, A. / Bachrouri, A. / Lopez, M. / Morante, J. R. / Misiuk, A. / Surma, B. / Jun, J.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

TEM characterisation of high pressure-high-temperature-treated Czochralski silicon samples

Contributors:

Romano-Rodriguez, A. (author) / Bachrouri, A. (author) / Lopez, M. (author) / Morante, J. R. (author) / Misiuk, A. (author) / Surma, B. (author) / Jun, J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 73 ; 250 - 254

Publication date:

2000-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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