Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Oxidation mechanism of fluorocarbon-incorporated silica for interlayer dielectric materials

    New search for: Sugahara, S.
    New search for: Fukumura, T.
    New search for: Matsumura, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Oxidation mechanism of fluorocarbon-incorporated silica for interlayer dielectric materials

    New search for: Sugahara, S.
    New search for: Fukumura, T.
    New search for: Matsumura, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Oxidation mechanism of fluorocarbon-incorporated silica for interlayer dielectric materials

    New search for: Sugahara, S.
    New search for: Fukumura, T.
    New search for: Matsumura, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Oxidation mechanism of fluorocarbon-incorporated silica for interlayer dielectric materials

    Contributors:

    Sugahara, S. (author) / Fukumura, T. (author) / Matsumura, M. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 3 ; 79-84

    Publication date:

    2000-01-01

    Size:

    6 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Low-Dielectric-Constant Materials for ULSI Interlayer-Dielectric Applications

    Lee, W. W. / Ho, P. S. | British Library Online Contents | 1997

    Fluorocarbon Elastomers

    Schroeder, Herman | Springer Verlag | 1999

    Fluorinated Amorphous Carbon as a Low-Dielectric-Constant Interlayer Dielectric

    Endo, K. | British Library Online Contents | 1997

    Low dielectric constant materials and methods for interlayer dielectric films in ultralarge-scale integrated circuit multilevel interconnections

    Homma, T. | British Library Online Contents | 1998

    ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas

    Lazzeri, P. / Hua, X. / Oehrlein, G. et al. | British Library Online Contents | 2006

    Back to top