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Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films

Martyniuk, M. / Antoszewski, J. / Musca, C. A. / Dell, J. M. / Faraone, L.

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Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films

Martyniuk, M. / Antoszewski, J. / Musca, C. A. / Dell, J. M. / Faraone, L.

Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films

Martyniuk, M. / Antoszewski, J. / Musca, C. A. / Dell, J. M. / Faraone, L.

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Check availability in my library

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Document information

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Document information

Title:

Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films

Contributors:

Martyniuk, M. (author) / Antoszewski, J. (author) / Musca, C. A. (author) / Dell, J. M. (author) / Faraone, L. (author)

Published in:

SMART MATERIALS AND STRUCTURES ; 15 ; S29-S38

Publication date:

2006-01-01

Size:

S29-S38

ISSN:

0964-1726

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 530

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