In situ spectroscopic ellipsometry study of TiO"2 films deposited by plasma enhanced chemical vapour deposition: Fid-Bau Portal

In situ spectroscopic ellipsometry study of TiO"2 films deposited by plasma enhanced chemical vapour deposition

Li, D. / Carette, M. / Granier, A. / Landesman, J. P. / Goullet, A.

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In situ spectroscopic ellipsometry study of TiO"2 films deposited by plasma enhanced chemical vapour deposition

Li, D. / Carette, M. / Granier, A. / Landesman, J. P. / Goullet, A.

In situ spectroscopic ellipsometry study of TiO"2 films deposited by plasma enhanced chemical vapour deposition

Li, D. / Carette, M. / Granier, A. / Landesman, J. P. / Goullet, A.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

In situ spectroscopic ellipsometry study of TiO"2 films deposited by plasma enhanced chemical vapour deposition

Contributors:

Li, D. (author) / Carette, M. (author) / Granier, A. (author) / Landesman, J. P. (author) / Goullet, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 283 ; 234-239

Publication date:

2013-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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