A platform for research: civil engineering, architecture and urbanism
Characterization of low dielectric constant amorphous carbon nitride films
Characterization of low dielectric constant amorphous carbon nitride films
Characterization of low dielectric constant amorphous carbon nitride films
Aono, M. (author) / Nitta, S. (author) / Katsuno, T. (author) / Itoh, T. (author) / Nonomura, S. (author)
APPLIED SURFACE SCIENCE ; 159-160 ; 341-344
2000-01-01
4 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Sputtered amorphous carbon nitride films
British Library Online Contents | 1995
|Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas
British Library Online Contents | 2010
|Fluorinated Amorphous Carbon as a Low-Dielectric-Constant Interlayer Dielectric
British Library Online Contents | 1997
|Semiconducting Amorphous Camphoric Carbon Nitride Thin Films
British Library Online Contents | 2005
|Optical Characterization of Amorphous Dielectric Films
British Library Online Contents | 1996
|