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    Conducting atomic force microscopy studies on local electrical properties of ultrathin SiO2 films

    New search for: Ando, A.
    New search for: Hasunuma, R.
    New search for: Maeda, T.
    New search for: Sakamoto, K.
    New search for: Miki, K.
    New search for: Nishioka, Y.
    New search for: Sakamoto, T.

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    Conducting atomic force microscopy studies on local electrical properties of ultrathin SiO2 films

    New search for: Ando, A.
    New search for: Hasunuma, R.
    New search for: Maeda, T.
    New search for: Sakamoto, K.
    New search for: Miki, K.
    New search for: Nishioka, Y.
    New search for: Sakamoto, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Conducting atomic force microscopy studies on local electrical properties of ultrathin SiO2 films

    New search for: Ando, A.
    New search for: Hasunuma, R.
    New search for: Maeda, T.
    New search for: Sakamoto, K.
    New search for: Miki, K.
    New search for: Nishioka, Y.
    New search for: Sakamoto, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Conducting atomic force microscopy studies on local electrical properties of ultrathin SiO2 films

    Contributors:

    Ando, A. (author) / Hasunuma, R. (author) / Maeda, T. (author) / Sakamoto, K. (author) / Miki, K. (author) / Nishioka, Y. (author) / Sakamoto, T. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 162/163 ; 401-405

    Publication date:

    2000-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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