Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Physical properties of a-C:H films prepared by electron cyclotron resonance microwave plasma chemical vapor deposition

    New search for: Zhou, X. T.
    New search for: Lee, S. T.
    New search for: Bello, I.
    New search for: Cheung, A. C.
    New search for: Chiu, D. S.
    New search for: Lam, Y. W.
    New search for: Lee, C. S.
    New search for: Leung, K. M.
    New search for: He, X. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Physical properties of a-C:H films prepared by electron cyclotron resonance microwave plasma chemical vapor deposition

    New search for: Zhou, X. T.
    New search for: Lee, S. T.
    New search for: Bello, I.
    New search for: Cheung, A. C.
    New search for: Chiu, D. S.
    New search for: Lam, Y. W.
    New search for: Lee, C. S.
    New search for: Leung, K. M.
    New search for: He, X. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Physical properties of a-C:H films prepared by electron cyclotron resonance microwave plasma chemical vapor deposition

    New search for: Zhou, X. T.
    New search for: Lee, S. T.
    New search for: Bello, I.
    New search for: Cheung, A. C.
    New search for: Chiu, D. S.
    New search for: Lam, Y. W.
    New search for: Lee, C. S.
    New search for: Leung, K. M.
    New search for: He, X. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Physical properties of a-C:H films prepared by electron cyclotron resonance microwave plasma chemical vapor deposition

    Contributors:

    Zhou, X. T. (author) / Lee, S. T. (author) / Bello, I. (author) / Cheung, A. C. (author) / Chiu, D. S. (author) / Lam, Y. W. (author) / Lee, C. S. (author) / Leung, K. M. (author) / He, X. M. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 77 ; 229 - 234

    Publication date:

    2000-01-01

    Size:

    6 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Study on the electron cyclotron resonance plasma chemical vapor deposition of carbon nanotubes

    Wang, Z. / Ba, D. / Cao, P. et al. | British Library Online Contents | 2007

    Synthesis of free standing carbon nanosheet using electron cyclotron resonance plasma enhanced chemical vapor deposition

    Thomas, R. / Rao, G. M. | British Library Online Contents | 2012

    Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

    Shufflebotham, P. / Weise, M. / Pirkle, D. et al. | British Library Online Contents | 1993

    Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

    Ryu, H.J. / Kim, S.H. / Hong, S.H. | British Library Online Contents | 2000

    Preparation of boron and phosphorus-doped SiC: H films using electron cyclotron resonance chemical vapor deposition: Some effects of microwave power

    Yoon, S. F. / Ji, R. / Ahn, J. | British Library Online Contents | 1999

    Back to top