Thermal evolution of extended defects in implanted Si: Fid-Bau Portal

Thermal evolution of extended defects in implanted Si

Claverie, A. / Colombeau, B. / Ben Assayag, G. / Bonafos, C. / Cristiano, F. / Omri, M. / de Mauduit, B.

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Thermal evolution of extended defects in implanted Si

Claverie, A. / Colombeau, B. / Ben Assayag, G. / Bonafos, C. / Cristiano, F. / Omri, M. / de Mauduit, B.

Thermal evolution of extended defects in implanted Si

Claverie, A. / Colombeau, B. / Ben Assayag, G. / Bonafos, C. / Cristiano, F. / Omri, M. / de Mauduit, B.

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Document information

Title:

Thermal evolution of extended defects in implanted Si

Contributors:

Claverie, A. (author) / Colombeau, B. (author) / Ben Assayag, G. (author) / Bonafos, C. (author) / Cristiano, F. (author) / Omri, M. (author) / de Mauduit, B. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 3 ; 269-277

Publication date:

2000-01-01

Size:

9 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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