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Ultrathin silicon dioxide films grown by photo-oxidation of silicon using 172 nm excimer lamps

Kaliwoh, N. / Zhang, J. Y. / Boyd, I. W.

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Ultrathin silicon dioxide films grown by photo-oxidation of silicon using 172 nm excimer lamps

Kaliwoh, N. / Zhang, J. Y. / Boyd, I. W.

Ultrathin silicon dioxide films grown by photo-oxidation of silicon using 172 nm excimer lamps

Kaliwoh, N. / Zhang, J. Y. / Boyd, I. W.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Ultrathin silicon dioxide films grown by photo-oxidation of silicon using 172 nm excimer lamps

Contributors:

Kaliwoh, N. (author) / Zhang, J. Y. (author) / Boyd, I. W. (author)

Published in:

APPLIED SURFACE SCIENCE ; 168 ; 288-291

Publication date:

2000-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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