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    Effects of deposition and annealing conditions on the structure and electrical properties of LPCVD silicon thin films

    New search for: Das, S.
    New search for: Shriram, R.
    New search for: Bhat, K. N.
    New search for: Rao, P. R. S.

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    Effects of deposition and annealing conditions on the structure and electrical properties of LPCVD silicon thin films

    New search for: Das, S.
    New search for: Shriram, R.
    New search for: Bhat, K. N.
    New search for: Rao, P. R. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effects of deposition and annealing conditions on the structure and electrical properties of LPCVD silicon thin films

    New search for: Das, S.
    New search for: Shriram, R.
    New search for: Bhat, K. N.
    New search for: Rao, P. R. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effects of deposition and annealing conditions on the structure and electrical properties of LPCVD silicon thin films

    Contributors:

    Das, S. (author) / Shriram, R. (author) / Bhat, K. N. (author) / Rao, P. R. S. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 35 ; 4743-4746

    Publication date:

    2000-01-01

    Size:

    4 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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