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Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments
Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments
Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments
Olson, J. M. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 51-60
2002-01-01
10 pages
Article (Journal)
English
DDC:
621.38152
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