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    Large-hole anode-type fast atom beam (LA-FAB) source and its application to high-aspect-ratio GaAs etching

    New search for: Watanabe, K.
    New search for: Hatakeyama, M.
    New search for: Ichiki, K.
    New search for: Satake, T.
    New search for: Kato, T.
    New search for: Nagai, K.

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    Large-hole anode-type fast atom beam (LA-FAB) source and its application to high-aspect-ratio GaAs etching

    New search for: Watanabe, K.
    New search for: Hatakeyama, M.
    New search for: Ichiki, K.
    New search for: Satake, T.
    New search for: Kato, T.
    New search for: Nagai, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Large-hole anode-type fast atom beam (LA-FAB) source and its application to high-aspect-ratio GaAs etching

    New search for: Watanabe, K.
    New search for: Hatakeyama, M.
    New search for: Ichiki, K.
    New search for: Satake, T.
    New search for: Kato, T.
    New search for: Nagai, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Large-hole anode-type fast atom beam (LA-FAB) source and its application to high-aspect-ratio GaAs etching

    Contributors:

    Watanabe, K. (author) / Hatakeyama, M. (author) / Ichiki, K. (author) / Satake, T. (author) / Kato, T. (author) / Nagai, K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 169-170 ; 603-606

    Publication date:

    2001-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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