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Research of Micro-Inertial Device High-Aspect-Ratio Etching Parameters

Shi, G.X. / Jia, S.X. / Jiang, G.Q. / Zhu, J.

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Research of Micro-Inertial Device High-Aspect-Ratio Etching Parameters

Shi, G.X. / Jia, S.X. / Jiang, G.Q. / Zhu, J.

Research of Micro-Inertial Device High-Aspect-Ratio Etching Parameters

Shi, G.X. / Jia, S.X. / Jiang, G.Q. / Zhu, J.

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Document information

Title:

Research of Micro-Inertial Device High-Aspect-Ratio Etching Parameters

Contributors:

Shi, G.X. (author) / Jia, S.X. (author) / Jiang, G.Q. (author) / Zhu, J. (author)

Published in:

KEY ENGINEERING MATERIALS ; 609/610 ; 706-709

Publication date:

2014-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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