Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Low-temperature selective epitaxy of silicon with chlorinated chemistry by RTCVD
Low-temperature selective epitaxy of silicon with chlorinated chemistry by RTCVD
Low-temperature selective epitaxy of silicon with chlorinated chemistry by RTCVD
Ribot, P. (Autor:in) / Dutartre, D. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 306 - 309
01.01.2002
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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