Application of high-resolution X-ray diffraction to study strain status in Si1-xGex/Si1-yGey/Si (001) heterostructures: Fid-Bau Portal

Application of high-resolution X-ray diffraction to study strain status in Si1-xGex/Si1-yGey/Si (001) heterostructures

Chtcherbatchev, K. D. / Sequeira, A. D. / Franco, N. / Barradas, N. P. / Myronov, M. / Mironov, O. A. / Parker, E. H.

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Application of high-resolution X-ray diffraction to study strain status in Si1-xGex/Si1-yGey/Si (001) heterostructures

Chtcherbatchev, K. D. / Sequeira, A. D. / Franco, N. / Barradas, N. P. / Myronov, M. / Mironov, O. A. / Parker, E. H.

Application of high-resolution X-ray diffraction to study strain status in Si1-xGex/Si1-yGey/Si (001) heterostructures

Chtcherbatchev, K. D. / Sequeira, A. D. / Franco, N. / Barradas, N. P. / Myronov, M. / Mironov, O. A. / Parker, E. H.

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Document information

Title:

Application of high-resolution X-ray diffraction to study strain status in Si1-xGex/Si1-yGey/Si (001) heterostructures

Contributors:

Chtcherbatchev, K. D. (author) / Sequeira, A. D. (author) / Franco, N. (author) / Barradas, N. P. (author) / Myronov, M. (author) / Mironov, O. A. (author) / Parker, E. H. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 91-92 ; 453 - 456

Publication date:

2002-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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