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Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas

Jeong, C. H. / Kim, D. W. / Bae, J. W. / Sung, Y. J. / Kwak, J. S. / Park, Y. J. / Yeom, G. Y.

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Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas

Jeong, C. H. / Kim, D. W. / Bae, J. W. / Sung, Y. J. / Kwak, J. S. / Park, Y. J. / Yeom, G. Y.

Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas

Jeong, C. H. / Kim, D. W. / Bae, J. W. / Sung, Y. J. / Kwak, J. S. / Park, Y. J. / Yeom, G. Y.

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Check availability in my library

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Document information

Title:

Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas

Contributors:

Jeong, C. H. (author) / Kim, D. W. (author) / Bae, J. W. (author) / Sung, Y. J. (author) / Kwak, J. S. (author) / Park, Y. J. (author) / Yeom, G. Y. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 93 ; 60 - 63

Publication date:

2002-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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